Researchers in the US have invented a new nanofabrication technique that can generate 2D patterns with very high rotational symmetries over large areas. Until now, only spatially repeating structures – which have sixfold or less rotational symmetry – could be patterned over such large areas using industrial photolithography techniques.
Dubbed moiré nanolithography, the technique can produced patterns with rotational symmetries as high as 36-fold – something that has never been observed in nature. Such high rotational symmetries could prove useful for a huge range of applications, from making better photonic crystals to boosting the performance of photovoltaic devices.
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